Multiscale modeling for epitaxial growth

  • Russel E. Caflisch

    UCLA, Los Angeles, USA
Multiscale modeling for epitaxial growth cover
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Abstract

Epitaxy is the growth of a thin film on a substrate in which the crystal properties of the film are inherited from those of the substrate. Because of the wide range of relevant length and time scales, multiscale mathematical models have been developed to describe epitaxial growth. This presentation describes atomistic, island dynamics and continuum models. Island dynamics models are multiscale models that use continuum coarse-graining in the lateral direction, but retain atomistic discreteness in the growth direction. Establishing connections between the various length and time scales in these models is a principal goal of mathematical materials science. Progress towards this goal is described here, including the derivation of surface diffusion, line tension and continuum equations from atomistic, kinetic models.